N-type crystalline silicon solar cells have the advantages of high minority carrier life, no light attenuation, good weak light effect, small temperature coefficient, etc., which is the hope for the crystalline silicon solar cells to move towards the highest theoretical efficiency. In 2019, p-type perc has become a new generation of conventional battery technology. Compared with p-type perc battery, n-type battery has greater potential for efficiency improvement, and it is expected that the market share of n-type battery will continue to increase. China's photovoltaic industry development roadmap 2018 predicts that the market share of n-type batteries will reach 15% in 2020 and 33% in 2025.

N-type crystalline silicon battery mainly includes n-pert / n-perl battery, n-topcon battery, interdigital back contact battery (IBC) and heterojunction battery (hjt). Among them, TOPCON and hjt are the focus of n-type technology. The highest efficiency of IBC battery has exceeded 25%, but the process is complex and the mass production is difficult. At present, only SunPower company in the United States has realized large-scale mass production. The first domestic IBC battery production line built by state power investment has a mass production efficiency of more than 23%, and the product is expected to go offline in October.

The technology of passivation contact (TOPCON) can prepare ultra-thin tunneling oxide layer and high doping polysilicon thin layer on the back of the battery, which can realize the whole passivation of the back without hole opening and alignment on the back, and is highly compatible with the traditional production process of crystalline silicon battery, so it is easy to upgrade the production line. At present, n-topcon technology has been highly concerned. In May 2019, Trina Solar Energy set a world record of 24.58% in the efficiency of large area TOPCON batteries. In terms of industrialization, n-topcon battery has advanced experience, most of which are upgraded by n-pert battery production line, and the mass production efficiency has exceeded 23%.

Heterojunction is regarded as the next generation of ultra-high efficiency battery technology with the most industrialization potential. In June 2019, the first 23% efficiency hjt battery chip of Tongwei was offline. In July, Junshi energy and Shanmei international signed a 10GW hjt battery production base cooperation agreement. In August, Dongfang Risheng 2.5gw heterojunction project was started. Hanergy set a world record of 24.85% for 6-inch silicon heterojunction battery. HJT technology has a series of advantages, such as simple process steps, high conversion efficiency, low temperature manufacturing, easy to flake and high double-sided rate. The key to low-cost mass production of heterojunction battery lies in the localization of equipment, the improvement of yield and production capacity, and the reduction of the cost of silicon wafer, low-temperature silver paste, TCO target and cleaning down chemicals.

The fourth n-type crystalline silicon battery and passivation contact technology forum 2019 will be held in Changzhou on December 10. The conference will discuss the prospect of photovoltaic industry and the market of n-type battery and double-sided power generation, the prospect of improving the quality of n-type silicon wafer, flakiness and cost reduction, the optimization of key equipment and process for mass production of n-pert / n-perl battery, n-topcon battery, hjt battery and IBC battery, the prospect of application and efficiency improvement of passivation contact technology in n-type battery, metallization process and advanced conductive slurry of TOPCON and hjt battery, n-type electricity The application of the pool in double-sided, half piece, multi main grid, laminated tile and high-density components, the calculation of the actual power generation gain and economy of n-type double-sided battery components, etc.

Notice of relevant matters is as follows:

1、 Seminar topics:
1. Prospect of photovoltaic industry and market analysis of n-type battery and double-sided power generation
2. Prospects for quality improvement, flaking and cost reduction of n-type silicon wafers
3. Application prospect of large-scale silicon in n-type battery and module
4. Prospect of application and efficiency improvement of passivation contact technology in n-type battery
5. Selection of mass production process and key technologies of n-topcon battery
6. Metallization process and conductive paste for n-topcon battery
7. Key doping and deposition equipment of n-topcon battery
8. Study on preparation technology of high quality passivation contact layer of n-topcon battery
9. Key technologies and mass production process selection of heterojunction battery
10. Metallization process and conductive paste for heterojunction battery
11. Price trend of key equipment and consumables of heterojunction battery
12. Analysis of the potential for mass production efficiency improvement and cost reduction of heterojunction batteries
13. Low cost IBC battery manufacturing process development and mass production
14. Application of passivation contact technology in IBC battery
15. application prospect of heterojunction combined with IBC technology or MWT Technology
16. Calculation of actual generation gain and economy of n-type double-sided battery module
17. Application of n-type battery in double-sided, half piece, multi main grid, laminated tile and high-density components
18. Mechanism analysis and solution of n-type battery letid

2、 Time: December 10, 2019
3、 Location: Sheraton Changzhou Fuli Hotel
4、 Registration time: 16:00-21:00, December 9, 2019
5、 Please contact:
Manager Chen: 021-68726606-109 / 13701609248 (wechat same number)
Joanna,u chen@
Or click the link to learn the latest schedule:

Conference fee: 3200 yuan / person, 2900 yuan / person for team application (same company ≥ 3 persons); English service fee of 2000 yuan for foreign guests

Note: the fee on the day of the meeting includes: lunch, tea break, dinner, Chinese Conference information, venue tickets, etc., excluding accommodation. The accommodation fee is directly settled with the hotel before check-out. The English service fee includes: English conference information, simultaneous interpretation fee, etc. on the day of the meeting
The measure of area: 500m2

• Truename:Manager Chen
• Mobile:13701609248
• E-mail:joanna_chen@chemweekly.com
• QQ:410192892
• Address:Jinqiao, Pudong, Shanghai

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